The microscope contains operating modes performed by the following attachable modules:
The high-resolution Scanning Electron Microscope is equipped with a Schottky Field Emission source, which provides a clear, sharp, and noise-free imaging. In combination with the optimized analytical chamber geometry and its five-axis, motorized tilt, eucentric specimen stage, the high- and stable beam current (≤ 200 nA, continuously adjustable) makes this a tool well suited for (automated) short- and long-time EDS analysis and mapping. Typical applications include nano-characterization of metals and alloys, oxidation/corrosion, fractures, welds, polished sections, magnetic and superconducting materials, ceramics, composites, plastics, films/coatings, geological sections, minerals, soft materials such as polymers, pharmaceuticals, filters, gels, tissues, particles, porous materials, fibers.
- The electron source, the cannon, of the Inspect F50 microscope is emitting in a Schottky field.
– The maximum acceleration voltage is software controlled and varies from a minimum of 200V to a maximum of 30 kV.
– The sample current is 200 nA.
– The vacuum system of the Inspect F50 microscope provides a vacuum in the sample chamber of 6 × 10-4 Pa.-4 Pa.
– The vacuum system of the Inspect F50 microscope ensures that the working vacuum is reached after changing the sample in a maximum of 2.5 minutes.
– The resolution on the secondary electron (SE) image must be maximum 1 nm at 30 kV and maximum 3 nm at 1 kV.
– The detector system in the configuration of the Inspect F50 SEM microscope allows to obtain a resolution on the image of secondary electrons (SE) of 1 nm at 30 kV and 3 nm at 1 kV.
– Highly precision monitored eucentric and compucentric sample fixing platform in microscope configuration is software controlled after five axes: x, y, z, tilting and rotating, allowing movements that ensure the analysis of the entire surface of the samples:
Titan Themis 200 is a scanning transmission electron cryo-microscope (cryoSTEM), equipped with field emission gun (FEG), having top performances in the following working modes: Transmission Electron Microscopy (TEM) and High Resolution Transmission Electron Microscopy (HRTEM), Scanning Transmission Electron Microscopy (STEM), Selected Area Electron Diffraction (SAED), CryoSTEM, 3D analysis in TEM and STEM modes, Energy Dispersive X-ray (EDX) microanalysis, Electron Energy Loss Spectroscopy (EELS), electron tomography in TEM. The advantages of this system, compared with other ones from the same class, are: high stability, controllability and reproducibility; field emission gun source (X-FEG), with high total current and lifetime; detectors system Super-X EDX, which makes possible the fast execution of analysis and elemental distribution maps; the 70° FOV Gatan system for cryo-transferring the samples (cross-sections or suspensions), frozen in the TEM holder at temperatures below -170°C. Additionally, transmission electron microscopy in cryogenic state of the samples contributes to the structural analysis for the beam sensitive samples (polymers, contaminated water, proteins, bacteria, sections of anatomic tissue, etc.).
- Titan Themis 200 is a state-of-the-art, 80-200 kV FEG cryo Scanning Transmission Electron Microscope of the Titan family, which is designed to deliver the ultimate in performance in all TEM, STEM, and EFTEM modes.
- Titan Themis 200 can analyze at low temperature in all (HR)TEM, STEM, EFTEM, SAED, CBED modes as well as 3D in TEM and STEM modes.
- The Titan Themis 200 is equipped with revolutionary technologies such as:
The Dual Beam Scanning Electron Microscope for Biological Applications Versa 3D is a combination of two systems: a scanning electron microscope (SEM) with field emission gun (FEG) that produces enlarged images of a variety of specimens achieving magnification over 100 000× providing high resolution imaging in a digital format; a focused ion beam (FIB) system that is capable of fast and precise milling of the specimen material, revealing the structure under the surface layer, making cross sections, TEM lamella, deposition layers, etc. The ion system produces high resolution images as well.
This system also produces high resolution images. Users can switch between the two bundles for fast navigation and precise grinding. The tool provides optimal efficiency, resolution, and automation.
The instrument combines the enhanced electron and ion column with the most advanced ion beam lithography system.
- Vacuum
- Source: Field emission gun assembly with NG Schottky emitter source.
- Voltage: 200 V to 30 kV (50 V landing energy possible with Beam Deceleration)
- Resolution:
– Ion optics: Field emission focused ion beam optics with liquid Gallium ion emitter.
Source lifetime: minimum 1000 working hours
- Voltage: 500V ÷ 30 kV
- Beam current: 1.5 pA to 65 nA in 15 steps
- Resolution: 7.0 nm at 30 kV at coincidence point, 5.0 nm at optimum working distance
- High precision 5-axes motorized stage
- Detectors
- Accessories
– Software:
The Raman LABRAM HR Evolution microscope from Horiba is a confocal microscope for high performance, used for making non-destructive spectral analyses, with very good spectral and spatial resolutions, with UV-VIS (ultraviolet-visible) and NIR (near-infrared) options, with the capability of making automated single point analysis and multi-point analysis. The LabRAM HR Evolution is prepared for UV analyses with its included optics and ensures a transmissibility of the optical signal in the spectral range 200 – 2100 nm and includes a module (remote) Raman coupled optical fibers for non-contact measurements remotely (for 633 nm) and an accessory (MACRO-CH) for determination of the Raman of liquids in vats with multipass effect to ensure the increasing intensity of the signal.
The instrument can:
The system has the following laser wavelengths, but also the optical and mechanical configurations for using these lasers:
The system allows further upgrade with additional lasers wavelengths in the UV, in visible or in infrared (325 nm, 532 nm, 830 nm, 1064 nm), switching between lasers, controlling the intensity of the laser power through the use of neutral density filters (with a motorized swivel support that has 9 positions: 100%, 50%, 25%, 10%, 5%, 2%, 1%, 0.1%, 0.01%), which are controlled by the software, the selection of the diffraction gratings (delivered with 2 diffraction gratings: 600 g/mm and 1800 g/mm, and the selection of rejection filters is completely automatized and software-controlled.
Filters
Detector
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